LRECS-1500M Winding Coating Machine
Category:
The company’s newly developed Lrecs-1500M winding coating machine is a large-scale, fully automated vacuum coating equipment that combines high efficiency with superior quality. It is compatible with a variety of materials, including PET, PI, and PP. This equipment can accommodate substrate films with a maximum diameter of 500 mm. When the substrate film thickness is 4.5 μm, it can perform coating operations on films measuring 10,000 to 20,000 meters in length, with a maximum production speed of up to 20 m/min. Moreover, the equipment supports double-sided coating in a single pass and features real-time monitoring via online instruments, ensuring a high yield rate in film formation.
Device features
● Fast deposition rate:
By enhancing plasma density through a magnetic field, sputtering efficiency is improved, enabling rapid thin-film deposition.
● High-quality film:
The prepared thin film exhibits good uniformity, high density, high purity, and strong adhesion to the substrate.
● Good film layer uniformity:
The magnetic field causes electrons to undergo helical motion on the target surface, enhancing the uniformity of the bombardment.
● Environmentally friendly and pollution-free:
It is carried out under high-vacuum conditions and does not produce harmful gases or waste.
● Simple equipment, easy to control:
Suitable for large-scale industrial production, capable of precisely controlling the thickness and composition of thin films.
● Wide range of applications:
Can be used to prepare various thin films, including metals, alloys, and oxides.
| Device model | LRECS-1500M |
| Device dimensions | Φ3000×2100(mm) |
| Basement membrane specifications | Φ500×1350(mm) |
| Basement membrane thickness | 4.5–125 (μm) |
| Effective coating width | 1000~1250 (mm) single- and double-sided coating |
| Coating system | 2 sets of vacuum coating systems |
| Vacuum pump unit | Molecular pump, roughing pump, Roots pump |
| ICP ion source | Two sets, one set on each side, primarily used for substrate surface treatment and auxiliary film formation—18 in total. Each side has one planar target material, used as a primer to enhance substrate adhesion. |
| Device target material | 8 on each side, primarily used for rapid film formation. |
| Cylindrical target material | 16 targets, with the electrical power for each target adjustable up to 18 kW. The key difference is that each target in the equipment has its own dedicated power supply. |
| Number of power supplies | 250KW |
| Device power | 6-20m/min |
| Film-forming speed | Thickness yield exceeds 90%, with real-time monitoring conducted using online monitoring instruments. |
| Film-forming yield | PI PET PP CPI etc. |
| Supporting materials | The sputtering process is optimally configured, ensuring no film defects during production. Tension control is properly managed, eliminating film defects caused by tension fluctuations. |
| Equipment advantages | Uneven wrinkles and thickness |
LRECS-1500M Winding Coating Machine
Category:
- Description
-
The company’s newly developed Lrecs-1500M winding coating machine is a large-scale, fully automated vacuum coating equipment that combines high efficiency with superior quality. It is compatible with a variety of materials, including PET, PI, and PP. This equipment can accommodate substrate films with a maximum diameter of 500 mm. When the substrate film thickness is 4.5 μm, it can perform coating operations on films measuring 10,000 to 20,000 meters in length, with a maximum production speed of up to 20 m/min. Moreover, the equipment supports double-sided coating in a single pass and features real-time monitoring via online instruments, ensuring a high yield rate in film formation.
Device features
● Fast deposition rate:
By enhancing plasma density through a magnetic field, sputtering efficiency is improved, enabling rapid thin-film deposition.● High-quality film:
The prepared thin film exhibits good uniformity, high density, high purity, and strong adhesion to the substrate.● Good film layer uniformity:
The magnetic field causes electrons to undergo helical motion on the target surface, enhancing the uniformity of the bombardment.● Environmentally friendly and pollution-free:
It is carried out under high-vacuum conditions and does not produce harmful gases or waste.● Simple equipment, easy to control:
Suitable for large-scale industrial production, capable of precisely controlling the thickness and composition of thin films.● Wide range of applications:
Can be used to prepare various thin films, including metals, alloys, and oxides.Device model LRECS-1500M Device dimensions Φ3000×2100(mm) Basement membrane specifications Φ500×1350(mm) Basement membrane thickness 4.5–125 (μm) Effective coating width 1000~1250 (mm) single- and double-sided coating Coating system 2 sets of vacuum coating systems Vacuum pump unit Molecular pump, roughing pump, Roots pump ICP ion source Two sets, one set on each side, primarily used for substrate surface treatment and auxiliary film formation—18 in total. Each side has one planar target material, used as a primer to enhance substrate adhesion. Device target material 8 on each side, primarily used for rapid film formation. Cylindrical target material 16 targets, with the electrical power for each target adjustable up to 18 kW. The key difference is that each target in the equipment has its own dedicated power supply. Number of power supplies 250KW Device power 6-20m/min Film-forming speed Thickness yield exceeds 90%, with real-time monitoring conducted using online monitoring instruments. Film-forming yield PI PET PP CPI etc. Supporting materials The sputtering process is optimally configured, ensuring no film defects during production. Tension control is properly managed, eliminating film defects caused by tension fluctuations. Equipment advantages Uneven wrinkles and thickness
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