LROCS-1680M Pro Vertical Optical Magnetron Sputtering Coating Machine
Category:
The LROCS 1680M Pro modular vertical magnetron sputtering optical coating equipment is a coating system specifically developed for the mass production of optical films as well as AR coatings or AR+AF coating layers. This equipment can deposit films such as SiO₂, NbOₓ, Si₃N₄, Cr, In, and Al onto various substrates including PET, PC, and glass.
This equipment features a modular design, and its process chamber is capable of accommodating both conventional reactive sputtering and post-oxidation sputtering processes. It can be used to fabricate thin films for the 3C industry, such as optical coatings and ultra-hard AR coatings. The films produced by this equipment exhibit excellent characteristics including strong adhesion, high density, uniformity, and repeatability. Moreover, the equipment’s manufacturing process is highly efficient and precise, ensuring high productivity at low production costs.
The equipment consists primarily of three major modules: the process chamber, the transition chamber, and the preparation chamber. The process chamber can function as a standalone single-chamber coating machine to independently deposit optical films and (ultra-hard) AR coatings. Alternatively, it can be combined with other modules such as the transition chamber and the preparation chamber to form a multi-chamber coating system, enabling the deposition of composite films like ultra-hard AR+AF coatings or ultra-hard AR+DLC+AF coatings. Customers can select different process configurations based on their specific application requirements and use a one-click process start-up method for simple, efficient operation.
Main structural configuration
● Device composition:
1. External clamping roller: Φ1680mm, used for loading and unloading external substrates;
2. Robot: Equipped with a 70 kg gripping force, used for loading and unloading external substrates;
3. Preparatory Chamber: Specifications (mm): 1728 mm × 2000 (H); material: 304 stainless steel with water-cooling water channels; equipped with built-in systems such as AF vapor deposition and plasma cleaning.
4. Transition Chamber: Used for transferring substrates inside the chamber, equipped with a fully automatic vacuum robotic arm capable of gripping up to 40 kg. The number of substrates accommodated is 14–16, with each substrate weighing up to 30 kg. The maximum rotation speed of the turntable is 80 rpm.
5. Process Chamber: Dimensions (mm): 1728 mm × 2000 (H); equipped with 4 reserved sputtering target positions and configured with 2 sets of ICP ion sources.
6. Vacuum System: Composed of a molecular pump and a mechanical pump. Pumping speed: From atmospheric pressure to 10 Pa—≤5 minutes; from atmospheric pressure to 5.0×10⁻³ Pa—40 minutes. Ultimate vacuum: 5.0×10⁻⁴ Pa.
● Operation Control: Fully automatic PLC control + KingView operating system.
● Machine footprint (mm): 12,000 (L) × 7,000 (W) × 5,000 (H).
● Total machine weight: <3000 kg.
LROCS-1680M Pro Vertical Optical Magnetron Sputtering Coating Machine
Category:
- Description
-
The LROCS 1680M Pro modular vertical magnetron sputtering optical coating equipment is a coating system specifically developed for the mass production of optical films as well as AR coatings or AR+AF coating layers. This equipment can deposit films such as SiO₂, NbOₓ, Si₃N₄, Cr, In, and Al onto various substrates including PET, PC, and glass.
This equipment features a modular design, and its process chamber is capable of accommodating both conventional reactive sputtering and post-oxidation sputtering processes. It can be used to fabricate thin films for the 3C industry, such as optical coatings and ultra-hard AR coatings. The films produced by this equipment exhibit excellent characteristics including strong adhesion, high density, uniformity, and repeatability. Moreover, the equipment’s manufacturing process is highly efficient and precise, ensuring high productivity at low production costs.
The equipment consists primarily of three major modules: the process chamber, the transition chamber, and the preparation chamber. The process chamber can function as a standalone single-chamber coating machine to independently deposit optical films and (ultra-hard) AR coatings. Alternatively, it can be combined with other modules such as the transition chamber and the preparation chamber to form a multi-chamber coating system, enabling the deposition of composite films like ultra-hard AR+AF coatings or ultra-hard AR+DLC+AF coatings. Customers can select different process configurations based on their specific application requirements and use a one-click process start-up method for simple, efficient operation.
Main structural configuration
● Device composition:
1. External clamping roller: Φ1680mm, used for loading and unloading external substrates;
2. Robot: Equipped with a 70 kg gripping force, used for loading and unloading external substrates;
3. Preparatory Chamber: Specifications (mm): 1728 mm × 2000 (H); material: 304 stainless steel with water-cooling water channels; equipped with built-in systems such as AF vapor deposition and plasma cleaning.
4. Transition Chamber: Used for transferring substrates inside the chamber, equipped with a fully automatic vacuum robotic arm capable of gripping up to 40 kg. The number of substrates accommodated is 14–16, with each substrate weighing up to 30 kg. The maximum rotation speed of the turntable is 80 rpm.
5. Process Chamber: Dimensions (mm): 1728 mm × 2000 (H); equipped with 4 reserved sputtering target positions and configured with 2 sets of ICP ion sources.
6. Vacuum System: Composed of a molecular pump and a mechanical pump. Pumping speed: From atmospheric pressure to 10 Pa—≤5 minutes; from atmospheric pressure to 5.0×10⁻³ Pa—40 minutes. Ultimate vacuum: 5.0×10⁻⁴ Pa.
● Operation Control: Fully automatic PLC control + KingView operating system.
● Machine footprint (mm): 12,000 (L) × 7,000 (W) × 5,000 (H).
● Total machine weight: <3000 kg.
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